Researchers from the University of Illinois at Urbana-Champaign have developed a one-step, facile method to pattern graphene by using stencil mask and oxygen plasma reactive-ion etching, and subsequent polymer-free direct transfer to flexible substrates. “Significant progress has been made in the direct synthesis of large-area, uniform, high quality graphene films using chemical vapor deposition (CVD) with various precursors and catalyst substrates,” explained SungWoo Nam, an Assistant Professor of Mechanical Science and Engineering.